CMP Diamond Disk

Engineered with uniform diamond protrusion height and high-compatibility design, balancing conditioning efficiency with extended pad life.

Product Features
  • Precisely controlled and uniform diamond protrusion
  • Increased contact area with polishing pads for improved surface uniformity
  • Optimized cutting rate to extend pad service life
  • Compatible with various slurries and pad materials
Process Applications
  • CMP pad conditioning and maintenance
  • Yield stabilization for advanced process nodes
Recommended Specifications
  • Diamond Grit Size: Customizable per process requirements
  • Substrate: Metal / Resin
  • Dimensions: Compatible with mainstream equipment platforms